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J. Appl. Phys. 99, 124906 (2006); http://dx.doi.org/10.1063/1.2204827 (4 pages)

Optical and electrical transport properties of facing-target sputtered Al doped ZnO transparent film

Z. Q. Li1, D. X. Zhang2, and J. J. Lin3

1Institute of Advanced Materials Physics, Faculty of Science, Tianjin University, Tianjin 300072, People’s Republic of China
2College of Information Technical Science, Nankai University, Tianjin 300071, People’s Republic of China
3Institute of Physics, National Chiao Tung University, Hsinchu 30010, Taiwan and Department of Electrophysics, National Chiao Tung University, Hsinchu 30010, Taiwan

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(Received 29 December 2005; accepted 15 April 2006; published online 22 June 2006)

Al doped zinc oxide thin film was prepared by dc facing-target sputtering method and its structural, optical, and electrical transport properties have been investigated. The average transmittance of the films is greater than 90% in the wavelength region of 450–700 nm while the resistivity is as high as 3×10−3 Ω cm. The band gap energy derived from the transmission data is 3.76 eV, which is higher than that of pure ZnO thin film. This band gap growth phenomenon cannot be explained in terms of the Burstein-Moss effect. The resistivity and Hall effect measurements suggest that the interaction between the charge carriers and phonons plays a key role in the electrical transport properties of the film between 60 and 300 K. The film exhibits negative magnetoresistance at low temperatures, which can be well described by a semiempirical expression that takes into account the third order s-d exchange Hamiltonians describing a negative part and a two-band model for positive contribution.

© 2006 American Institute of Physics

Article Outline

  1. INTRODUCTION
  2. EXPERIMENT
  3. RESULTS AND DISCUSSION
  4. SUMMARY

RELATED DATABASES

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KEYWORDS and PACS

PACS

  • 81.05.Dz

    II-VI semiconductors

  • 78.66.Hf

    II-VI semiconductors

  • 73.61.Ga

    II-VI semiconductors

  • 68.55.-a

    Thin film structure and morphology

  • 81.15.Cd

    Deposition by sputtering

  • 63.22.-m

    Phonons or vibrational states in low-dimensional structures and nanoscale materials

ARTICLE DATA

PUBLICATION DATA

ISSN

0021-8979 (print)  
1089-7550 (online)

For access to fully linked references, you need to log in.
    Ü. Özgür et al., J. Appl. Phys. 98, 041301 (2005)JAPIAU000098000004041301000001.

    K. H. Kim, K. C. Park, and D. Y. Ma, J. Appl. Phys. 81, 7764 (1997)JAPIAU000081000012007764000001.

    Z. Q. Li and J. J. Lin, J. Appl. Phys. 96, 5918 (2004)JAPIAU000096000010005918000001.

    M. Gabás, S. Gota, J. R. Ramos-Barrado, M. Sánchez, N. T. Barrett, J. Avila, and M. Sacchi, Appl. Phys. Lett. 86, 042104 (2005)APPLAB000086000004042104000001.

    C. Y. Wu and J. J. Lin, Phys. Rev. B 50, 385 (1994).


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