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J. Appl. Phys. 97, 013509 (2005); http://dx.doi.org/10.1063/1.1823574 (6 pages)

Modifications of ZnO thin films under dense electronic excitation

P. M. Ratheesh Kumar1, C. Sudha Kartha1, K. P. Vijayakumar1, F. Singh2, D. K. Avasthi2, T. Abe3, Y. Kashiwaba3, G. S. Okram4, M. Kumar5, and Sarvesh Kumar6

1Department of Physics, Cochin University of Science and Technology, Kochi 682 022, India
2Nuclear Science Centre, Aruna Asaf Ali Road, New Delhi 110 067, India
3Department of Electrical and Electronic Engineering, Iwate University, Morioka 020-8551, Japan
4Inter-University Consortium for DAE facilities, University Campus, Khandwa Road, Indore 452 001, India
5Department of Physics, Allahabad University, Allahabad 211 002, India
6Department of Physics, R B S College, Agra 282 002, India

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(Received 5 February 2004; accepted 30 September 2004; published online 13 December 2004)

Spray pyrolyzed ZnO films prepared using solution containing ethanol and water (volume ratio 1:1), exhibited optical transmission of 85% in the visible range and electrical resistivity of 78 Ω cm. These samples were irradiated using 120 MeV Au ion beam and then characterized using optical absorption and transmission, x-ray diffraction (XRD), electrical resistivity measurements, x-ray photoelectron spectroscopy (XPS), and photoluminescence studies. It appears that irradiation does not affect absorption edge while optical transmittance was slightly reduced. But intensities of peaks of XRD and photoluminescence were found to decrease continuously with increasing ion fluence. Electrical resistivity of the films decreased considerably (from 78 to 0.71 Ω cm) with increase in ion fluence. Atomic concentration from XPS analysis showed that Zn/O ratio is getting increased due to ion beam irradiation. Variations in carrier concentration were also measured using Hall measurements.

© 2005 American Institute of Physics

Article Outline

  1. INTRODUCTION
  2. EXPERIMENTAL
  3. RESULTS AND DISCUSSION
    1. XRD analysis
    2. Optical studies
    3. Electrical studies
    4. Photoluminescence studies
    5. XPS analysis
  4. CONCLUSION

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KEYWORDS and PACS

PACS

  • 81.05.Dz

    II-VI semiconductors

  • 61.82.Fk

    Semiconductors

  • 73.20.Mf

    Collective excitations (including excitons, polarons, plasmons and other charge-density excitations)

  • 79.60.Dp

    Adsorbed layers and thin films

  • 61.80.Jh

    Ion radiation effects

  • 81.15.Rs

    Spray coating techniques

  • 73.61.Ga

    II-VI semiconductors

  • 78.55.Et

    II-VI semiconductors

  • 78.66.Hf

    II-VI semiconductors

ARTICLE DATA

PUBLICATION DATA

ISSN

0021-8979 (print)  
1089-7550 (online)

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