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J. Appl. Phys. 92, 2916 (2002); http://dx.doi.org/10.1063/1.1499529 (7 pages)
Deposition kinetics on particles in a dusty plasma reactor
(Received 6 March 2002; accepted 15 June 2002)
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Add to FacebookWe report on the use of dusty plasma chemical vapor deposition for the coating of micron and submicron sized particles. Particles are introduced into a capacitively coupled low-pressure plasma where they become charged and remain electrostatically confined over extended periods of time. Introduction of a hydrocarbon in the plasma results in the formation of a cross-linked solid (plasma polymer) which deposits on the particle surface in the form of a film. The thickness of the coating varies from 3 nm to more than several hundred nanometers and is found to be a linear function of time. The size distribution and the uniformity of deposition are studied as a function of the deposition time and particle size and the results are interpreted qualitatively via a surface deposition model. © 2002 American Institute of Physics.
© 2002 American Institute of Physics
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