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Journal of Applied Physics / Volume 68 / Issue 8

J. Appl. Phys. 68, 4253 (1990); http://dx.doi.org/10.1063/1.346216 (5 pages)

Negative charge emission due to excimer laser bombardment of sodium trisilicate glass

S. C. Langford1, L. C. Jensen1, J. T. Dickinson1, and L. R. Pederson2

1Physics Department, Washington State University, Pullman, Washington 99164‐2814
2Pacific Northwest Laboratories, Richland, Washington 99352

(Received 4 April 1990; accepted 18 June 1990)

We describe measurements of negative charge emission accompanying irradiation of sodium trisilicate glass (Na2O⋅3SiO2) with 248‐nm excimer laser light at fluences on the order of 2 J/cm2 per pulse, i.e., at the threshold for ablative etching of the glass surface. The negative charge emission consists of a very prompt photoelectron burst coincident with the laser pulse, followed by a much slower plume of electrons and negative ions traveling with a high density cloud of positive ions, previously identified as primarily Na+. Using combinations of E and B fields in conjunction with time‐of‐flight methods, the negative ions were successfully separated from the plume and tentatively identified as O−, Si−, NaO−, and perhaps NaSi−. These negative species are probably formed by gas phase collisions in the near‐surface region which result in electron attachment.

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KEYWORDS and PACS

Keywords

SODIUM SILICATES, GLASS, LASER RADIATION, EXCIMER LASERS, ION EMISSION, TIME−OF−FLIGHT METHOD, PHOTON COLLISIONS

PACS

ARTICLE DATA

Digital Object Identifier
http://dx.doi.org/10.1063/1.346216

PUBLICATION DATA

ISSN

0021-8979 (print)  
1089-7550 (online)

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    References

    D. Dijkkamp, T. Venkatesan, X. D. Wu, W. A. Shakeen, N. Jisrani, Y. M. Min-Lu, W. L. McLean, and M. Croft, Appl. Phys. Lett. 51, 619 (1987APPLAB000051000008000619000001).

    S. Witanachchi, H. S. Kwok, X. W. Wang, and D. T. Shaw, Appl. Phys. Lett. 53, 234 (1988APPLAB000053000003000234000001).

    J. T. Dickinson, S. C. Langford, L. C. Jensen, P. A. Eschbach, L. R. Pederson, and D. R. Baer, J. Appl. Phys. 68, 1831 (1990JAPIAU000068000004001831000001).

    P. F. Dittner and S. Datz, J. Chem. Phys. 68, 2451 (1978JCPSA6000068000005002451000001).

    Yicheng Wang, M. A. Huels, D. R. Gallagher, L. D. Doverspike, and R. L. Champion, Phys. Rev. Lett. 61, 1194 (1988).


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