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J. Appl. Phys. 111, 07A704 (2012); http://dx.doi.org/10.1063/1.3670986 (3 pages)
Effects of substrate on structure and the magnetic properties of (001)-textured FePt films grown at low temperature
(Received 21 September 2011; accepted 17 October 2011; published online 10 February 2012)
© 2012 American Institute of Physics
Article Outline
- INTRODUCTION
- EXPERIMENTAL PROCEDURES
- RESULTS AND DISCUSSIONS
- CONCLUSIONS
KEYWORDS, PACS, and IPC
Keywords
coercive force, crystal structure, iron alloys, magnetic anisotropy, magnetic multilayers, magnetic thin films, metallic thin films, platinum alloys, sputter deposition, texture
PACS
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Magnetic properties of monolayers and thin films
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Cold working, work hardening; annealing, post-deformation annealing, quenching, tempering recovery, and crystallization
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Deposition by sputtering
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Nucleation and growth
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Magnetization curves, hysteresis, Barkhausen and related effects
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Magnetic anisotropy
ARTICLE DATA
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C. B. Rong, V. Nandwana, N. Poudyal, J. P. Liu, M. E. Kozlov, R. H. Baughman, Y. Ding, and Z. L. Wang, J. Appl. Phys. 102, 023908 (2007)JAPIAU000102000002023908000001.
C. B. Rong and J. P. Liu, Appl. Phys. Lett. 90, 222504 (2007)APPLAB000090000022222504000001.
J. K. Mei, F. T. Yuan, W. M. Liao, Y. D. Yao, H. M. Lin, H. Y. Lee, and J. H. Hsu, J. Appl. Phys. 109, 07A737 (2011)JAPIAU00010900000707A737000001.
S. N. Hsiao, F. T. Yuan, H. W. Chang, H. W. Huang, S. K. Chen, and H. Y. Lee, Appl. Phys. Lett. 94, 232505 (2009)APPLAB000094000023232505000001.
C. Feng, Q. Zhan, B. H. Li, J. Teng, M. H. Li, Y. Jiang, and G. H. Yu, Appl. Phys. Lett. 93, 152513 (2008)APPLAB000093000015152513000001.
J. S. Chen, B. C. Lim, J. F. Hu, B. Liu, G. M. Chow, and G. Ju, Appl. Phys. Lett. 91, 132506 (2007)APPLAB000091000013132506000001.
G. R. Trichy, D. Chakraborti, J. Narayan, and J. T. Prater, Appl. Phys. Lett. 92, 102504 (2008)APPLAB000092000010102504000001.
B. Laenens, F. M. Almeida, N. Planckaert, K. Temst, J. Meersschaut, A. Vantomme, C. Rentenberger, M. Rennhofer, and B. Sepiol, J. Appl. Phys. 105, 073913 (2009)JAPIAU000105000007073913000001.
Z. Y. Zhai, X. S. Wu, Z. S. Jiang, J. H. Hao, J. Gao, Y. F. Cai, and Y. G. Pan, Appl. Phys. Lett. 89, 262902 (2006)APPLAB000089000026262902000001.
Y. Endo, N. Kikuchi, O. Kitakami, and Y. Shimada, J. Appl. Phys. 89, 7065 (2001)JAPIAU000089000011007065000001.
A. M. Zhang, X. S. Wu, L. Sun, W. T. Sheng, B. You, J. Du, M. Lu, and A. Hu, J. Appl. Phys. 95, 7294 (2004)JAPIAU000095000011007294000001.
J. S. Chen, B. C. Lim, J. F. Hu, Y. K. Lim, B. Liu, and G. M. Chow, Appl. Phys. Lett. 90, 042508 (2007)APPLAB000090000004042508000001.
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