• Volume/Page
  • Keyword
  • DOI
  • Citation
  • Advanced
   
 
 
 

Flickr Twitter UniPHY Group iResearch App Facebook

J. Appl. Phys. 111, 07A304 (2012); http://dx.doi.org/10.1063/1.3670605 (3 pages)

Tuning of magnetization dynamics in sputtered CoFeB thin film by gas pressure

Feng Xu1,2, Qijun Huang1, Zhiqin Liao1, Shandong Li3, and C. K. Ong4

1School of Materials Science and Engineering, Nanjing University of Science and Technology, Nanjing 210094, People’s Republic of China
2Laboratory of Solid State Microstructures, Nanjing University, Nanjing 210093, People’s Republic of China
3Physics Department, Fujian Normal University, Fuzhou 350007, People’s Republic of China
4Physics Department, National University of Singapore, Singapore 117542, Singapore

View MapView Map

(Received 22 September 2011; accepted 13 October 2011; published online 9 February 2012)

The influences of sputtering gas pressure on the high-frequency magnetization dynamics of as-sputtered CoFeB thin films are studied with permeability spectra based on the Landau-Lifshitz-Gilbert (LLG) equation. Results show that with the pressure increasing, both the anisotropy field and resonance frequency have minimums, while the initial permeability shows a maximum. The damping factor deceases monotonously with the pressure increasing, similar as with the coercivity. The high tunability of the damping factor indicates that controlling sputtering gas pressure could be an effective method in tuning the magnetization dynamics. All these dependences on gas pressure are suggested to be related to the inner stress of these sputtered films.

© 2012 American Institute of Physics

Article Outline

  1. INTRODUCTION
  2. EXPERIMENT
  3. RESULTS AND DISCUSSION
  4. CONCLUSION

KEYWORDS, PACS, and IPC

PACS

  • 75.70.Ak

    Magnetic properties of monolayers and thin films

  • 68.55.A-

    Nucleation and growth

  • 81.15.Cd

    Deposition by sputtering

  • 75.60.Ej

    Magnetization curves, hysteresis, Barkhausen and related effects

  • 75.30.Gw

    Magnetic anisotropy

  • 68.60.Bs

    Mechanical and acoustical properties

International Patent Classification (IPC)

ARTICLE DATA

PUBLICATION DATA

ISSN

0021-8979 (print)  
1089-7550 (online)

For access to fully linked references, you need to log in.
    Y. Hayakawa, A. Makino, H. Fujimori, and A. Inoue, J. Appl. Phys. 81, 3747 (1997)JAPIAU000081000008003747000001.

    M. Ohnuma, K. Hono, H. Onodera, S. Ohnuma, H. Fujimori, and J. S. Pedersen, J. Appl. Phys. 87, 817 (2000)JAPIAU000087000002000817000001.

    C. Yoshida, M. Kurasawa, Y. M. Lee, M. Aoki, and Y. Sugiyama, Appl. Phys. Lett. 92, 113508 (2008)APPLAB000092000011113508000001.

    C. Bilzer, T. Devolder, J.-V. Kim, G. Counil, C. Chappert, S. Cardoso, and P. P. Freitas, J. Appl. Phys. 100, 053903 (2006)JAPIAU000100000005053903000001.

    T. J. Fal, V. Veerakumar, B. Kuanr, Y. V. Khivintsev, Z. Celinski, and R. E. Camley, J. Appl. Phys. 102, 063907 (2007)JAPIAU000102000006063907000001.

    Y. V. Khivintsev, B. K. Kuanr, I. Harward, R. E. Camley, and Z. Celinski, J. Appl. Phys. 99, 08P512 (2006)JAPIAU00009900000808P512000001.

    J. McCord, R. Kaltofen, O. G. Schmidt, and L. Schultz, Appl. Phys. Lett. 92, 162506 (2008)APPLAB000092000016162506000001.

    F. Xu, N. N. Phuoc, X. Zhang, Y. Ma, X. Chen, and C. K. Ong, J. Appl. Phys. 104, 093903 (2008)JAPIAU000104000009093903000001.

    Y. Liu, L. F. Chen, C. Y. Tan, H. J. Liu, and C. K. Ong, Rev. Sci. Instrum. 76, 063911 (2005)RSINAK000076000006063911000001.

    J. B. Youssef, N. Vukadinovic, D. Billet, and M. Labrune, Phys. Rev. B 69, 174402 (2004).


Figures (4)

Access to article objects (figures, tables, multimedia) requires a subscription; log in to view available files.
(Access to supplementary files, where available, is free for this journal.)



Close
Google Calendar
ADVERTISEMENT

close