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Journal of Applied Physics / Volume 110 / Issue 5 / ARTICLES / Nanoscale Science and Design

J. Appl. Phys. 110, 054317 (2011); http://dx.doi.org/10.1063/1.3633234 (6 pages)

On the solubility of yttrium in RuO2

Denis Music, Naemi A. Zumdick, Bengt Hallstedt, and Jochen M. Schneider

Materials Chemistry, RWTH Aachen University, D-52056 Aachen, Germany

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(Received 18 July 2011; accepted 6 August 2011; published online 12 September 2011)

We have investigated the solubility of Y in rutile RuO2 using experimental and theoretical methods. Nanostructured Ru–Y–O thin films were synthesized via combinatorial reactive sputtering with an O/metal ratio of 2.6 and a Y content of 0.3 to 12.6 at. %. A solubility limit of 1.7 at. % was identified using x-ray photoelectron spectroscopy and x-ray diffraction. Based on ab initio and thermodynamic modeling, the solubility of Y can be understood. Smaller Y amounts are incorporated into the lattice, forming a metastable film, with local structural deformations due to size effects. As the Y content is increased, extensive local structural deformations are observed, but phase separation does not occur due to kinetic limitations. Nanostructured RuO2 alloyed with Y might lead to enhanced phonon scattering and quantum confinement effects, which in turn improve the thermoelectric efficiency.

© 2011 American Institute of Physics

Article Outline

  1. INTRODUCTION
  2. EXPERIMENTAL METHODS
  3. THEORETICAL METHODS
  4. RESULTS AND DISCUSSION
  5. CONCLUSIONS

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KEYWORDS and PACS

Keywords

ab initio calculations, nanofabrication, nanostructured materials, phase separation, solubility, sputter deposition, thin films, X-ray diffraction, X-ray photoelectron spectra, yttrium compounds

PACS

  • 81.07.-b

    Nanoscale materials and structures: fabrication and characterization

  • 81.15.Cd

    Deposition by sputtering

  • 61.46.-w

    Structure of nanoscale materials

  • 64.75.Bc

    Solubility

  • 68.55.aj

    Insulators

  • 81.16.-c

    Methods of micro- and nanofabrication and processing

ARTICLE DATA

Digital Object Identifier
http://dx.doi.org/10.1063/1.3633234

PUBLICATION DATA

ISSN

0021-8979 (print)  
1089-7550 (online)

Publisher

$abstract.society.value is a Member of CrossRef American Institute of Physics

For access to fully linked references, you need to log in.
    D. Music, F. H.-U. Basse, R. Haßdorf, and J. M. Schneider, J. Appl. Phys. 108, 013707 (2010)JAPIAU000108000001013707000001.

    Y.-T. Lin, C.-Y. Chen, C.-P. Hsiung, K.-W. Cheng, and J.-Y. Gan, Appl. Phys. Lett. 89, 063123 (2006)APPLAB000089000006063123000001.

    T. Ozaki and H. Kino, Phys. Rev. B 72, 045121 (2005).

    T. Ozaki, Phys. Rev. B 67, 155108 (2003).

    P. E. Blöchl, Phys. Rev. B 41, 5414 (1990).

    T. Ozaki and H. Kino, Phys. Rev. B 69, 195113 (2004).

    A. S. Barnard and P. Zapol, Phys. Rev. B 70, 235403 (2004).

    H. R. Gong, L. T. Kong, and B. X. Liu, Phys. Rev. B 69, 024202 (2004).


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