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J. Appl. Phys. 109, 121301 (2011); http://dx.doi.org/10.1063/1.3581173 (33 pages)

ZnO Schottky barriers and Ohmic contacts

Leonard J. Brillson1 and Yicheng Lu2

1Departments of Electrical and Computer Engineering, Department of Physics, and Center for Materials Research, Ohio State University, Columbus, Ohio 43210, USA
2 Department of Electrical and Computer Engineering, Rutgers University, Piscataway, New Jersey 08854, USA

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(Received 30 November 2010; accepted 10 February 2011; published online 23 June 2011)

ZnO has emerged as a promising candidate for optoelectronic and microelectronic applications, whose development requires greater understanding and control of their electronic contacts. The rapid pace of ZnO research over the past decade has yielded considerable new information on the nature of ZnO interfaces with metals. Work on ZnO contacts over the past decade has now been carried out on high quality material, nearly free from complicating factors such as impurities, morphological and native point defects. Based on the high quality bulk and thin film crystals now available, ZnO exhibits a range of systematic interface electronic structure that can be understood at the atomic scale. Here we provide a comprehensive review of Schottky barrier and ohmic contacts including work extending over the past half century. For Schottky barriers, these results span the nature of ZnO surface charge transfer, the roles of surface cleaning, crystal quality, chemical interactions, and defect formation. For ohmic contacts, these studies encompass the nature of metal-specific interactions, the role of annealing, multilayered contacts, alloyed contacts, metallization schemes for state-of-the-art contacts, and their application to n-type versus p-type ZnO. Both ZnO Schottky barriers and ohmic contacts show a wide range of phenomena and electronic behavior, which can all be directly tied to chemical and structural changes on an atomic scale.

© 2011 American Institute of Physics

Article Outline

  1. INTRODUCTION
  2. TECHNICAL BACKGROUND
    1. Schottky barriers
    2. Ohmic contacts
  3. EMERGING ZnO ELECTRONICS NEEDS
    1. Schottky barrier contacts
    2. Ohmic contacts
  4. ZnO SURFACE EFFECTS
  5. METAL-ZNO SCHOTTKY BARRIERS
    1. Early contact studies
    2. Surface cleaning effects
      1. Effects in vacuum
      2. Effects of impurities and defects
      3. Effects on Schottky barriers
        1. Crystal quality
        2. Surface treatment
        3. Measurement technique
    3. Crystal quality and surface effects
      1. Crystal defect variations
      2. Electronic effects of crystal defects and impurities
      3. Morphology effects
      4. Polarity effects
    4. Chemical effects on ZnO Schottky barriers
      1. Metal dependence of interface chemistry
      2. Interface chemistry and defect formation
      3. Defect formation and Schottky barriers
    5. Complementary Schottky barrier mechanisms
  6. OHMIC CONTACTS TO ZnO
    1. Background of ohmic contacts to ZnO
    2. Nonalloyed ohmic contacts to n -type ZnO
      1. Metallization schemes for nonalloyed ohmic contacts
        1. In-ZnO:
        2. Ti-ZnO:
        3. Al-ZnO:
        4. Al-Ti-ZnO:
        5. Pt-Ga-ZnO:
      2. Nonalloyed ohmic contacts to ZnO nanostructures
    3. Alloyed ohmic contacts to n -type ZnO
      1. Single layer metallization schemes
      2. Double layer metallization schemes
      3. Multi-layer metallization schemes
    4. Alloyed ohmic contacts to p -ZnO
      1. Single layer metallization schemes
      2. Double layer metallization schemes
      3. Multilayer metallization schemes
      4. Ohmic contacts to ZnO alloys
  7. CONCLUSIONS

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KEYWORDS and PACS

PACS

  • 73.40.Ns

    Metal-nonmetal contacts

  • 73.30.+y

    Surface double layers, Schottky barriers, and work functions

  • 81.65.Cf

    Surface cleaning, etching, patterning

  • 61.72.Cc

    Kinetics of defect formation and annealing

  • 85.40.Ls

    Metallization, contacts, interconnects; device isolation

  • 73.25.+i

    Surface conductivity and carrier phenomena

ARTICLE DATA

PUBLICATION DATA

ISSN

0021-8979 (print)  
1089-7550 (online)

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