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Journal of Applied Physics / Volume 107 / Issue 9 / ARTICLES / Plasmas and Electrical Discharges

J. Appl. Phys. 107, 093306 (2010); http://dx.doi.org/10.1063/1.3369287 (5 pages)

Ion energy distribution near a plasma meniscus with beam extraction for multi element focused ion beams

Jose V. Mathew, Samit Paul, and Sudeep Bhattacharjee

Department of Physics, Indian Institute of Technology, Kanpur 208016, Uttar Pradesh, India

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(Received 22 December 2009; accepted 20 February 2010; published online 7 May 2010)

An earlier study of the axial ion energy distribution in the extraction region (plasma meniscus) of a compact microwave plasma ion source showed that the axial ion energy spread near the meniscus is small ( ∼ 5 eV) and comparable to that of a liquid metal ion source, making it a promising candidate for focused ion beam (FIB) applications [ J. V. Mathew and S. Bhattacharjee, J. Appl. Phys. 105, 96101 (2009) ]. In the present work we have investigated the radial ion energy distribution (IED) under the influence of beam extraction. Initially a single Einzel lens system has been used for beam extraction with potentials up to −6 kV for obtaining parallel beams. In situ measurements of IED with extraction voltages upto −5 kV indicates that beam extraction has a weak influence on the energy spread (±0.5 eV) which is of significance from the point of view of FIB applications. It is found that by reducing the geometrical acceptance angle at the ion energy analyzer probe, close to unidirectional distribution can be obtained with a spread that is smaller by at least 1 eV.

© 2010 American Institute of Physics

Article Outline

  1. INTRODUCTION
  2. EXPERIMENTAL SETUP
  3. RESULTS AND DISCUSSION
  4. SUMMARY

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KEYWORDS and PACS

Keywords

focused ion beam technology, ion beams, plasma sources

PACS

ARTICLE DATA

Digital Object Identifier
http://dx.doi.org/10.1063/1.3369287

PUBLICATION DATA

ISSN

0021-8979 (print)  
1089-7550 (online)

Publisher

$abstract.society.value is a Member of CrossRef American Institute of Physics

For access to fully linked references, you need to log in.
    J. V. Mathew, A. Chowdhury, and S. Bhattacharjee, Rev. Sci. Instrum. 79, 063504 (2008)RSINAK000079000006063504000001.

    J. V. Mathew, I. Dey, and S. Bhattacharjee, Appl. Phys. Lett. 91, 041503 (2007)APPLAB000091000004041503000001.

    J. V. Mathew and S. Bhattacharjee, J. Appl. Phys. 105, 096101 (2009)JAPIAU000105000009096101000001.

    C. Bohm and J. Perrin, Rev. Sci. Instrum. 64, 31 (1993)RSINAK000064000001000031000001.

    R. L. Stenzel, R. Williams, R. Agüero, K. Kitazaki, A. Ling, T. McDonald, and J. Spitzer, Rev. Sci. Instrum. 53, 1027 (1982)RSINAK000053000007001027000001.

    Y. Okuno, Y. Ohtsu, and H. Fujita, J. Appl. Phys. 74, 5990 (1993)JAPIAU000074000010005990000001.

    I. Dey and S. Bhattacharjee, Phys. Plasmas 15, 123502 (2008)PHPAEN000015000012123502000001.


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