jap banner
  • Volume/Page
  • Keyword
  • DOI
  • Citation
  • Advanced
   
 
 
 

Flickr Twitter UniPHY Group iResearch App Facebook

Journal of Applied Physics / Volume 107 / Issue 9 / ARTICLES / Plasmas and Electrical Discharges

J. Appl. Phys. 107, 093305 (2010); http://dx.doi.org/10.1063/1.3369286 (6 pages)

H-atom interaction with amorphous hydrocarbon films: Effect of surface temperature, H flux and exposure time

A. Erradi1,2, R. Clergereaux1,2, and F. Gaboriau1,2

1UPS, INPT, LAPLACE (Laboratoire Plasma et Conversion d'Energie), Université de Toulouse, 118 route de Narbonne, F-31062 Toulouse cedex 9, France
2LAPLACE, CNRS, F-31062 Toulouse, France

View MapView Map

(Received 7 December 2009; accepted 20 February 2010; published online 7 May 2010)

In the present paper, we study the interaction between atomic hydrogen generated in a microwave afterglow with amorphous hydrogenated carbon films. A simple surface model is described and compared with the experimental results. Erosion rate is time dependent and exhibits a transient regime before reaching a constant value. Estimate of the modified film thickness by ellipsometry shows that thickness increases with time and becomes constant and equal to 1.4 nm when reaching the permanent regime. In addition, this limit is independent on the conditions, e.g., on hydrogen flux and temperature. Erosion rate depends linearly on hydrogen flux arriving at the surface and shows an exponential increase with surface temperature. A simple model proposed in the paper is in good agreement with the experimental data and allows giving an estimate of the erosion activation energy Ea = 0.2 eV. This value is in agreement with the energy involved in the reaction between hydrogen atom and carbon atom in sp3 hybridization.

© 2010 American Institute of Physics

Article Outline

  1. INTRODUCTION
  2. EXPERIMENTAL SETUP
  3. EXPERIMENTAL RESULTS
  4. DISCUSSION
  5. CONCLUSION

RELATED DATABASES

To view database links for this article, you need to log in.

KEYWORDS and PACS

Keywords

afterglows, amorphous state, atom-surface impact, carbon, ellipsometry, hydrogen, thin films, wear

PACS

  • 81.05.U-

    Carbon/carbon-based materials

  • 79.20.Rf

    Atomic, molecular, and ion beam impact and interactions with surfaces

  • 81.40.Pq

    Friction, lubrication, and wear

  • 62.20.Qp

    Friction, tribology, and hardness

  • 68.55.jd

    Thickness

  • 52.80.Hc

    Glow; corona

ARTICLE DATA

Digital Object Identifier
http://dx.doi.org/10.1063/1.3369286

PUBLICATION DATA

ISSN

0021-8979 (print)  
1089-7550 (online)

Publisher

$abstract.society.value is a Member of CrossRef American Institute of Physics

For access to fully linked references, you need to log in.
    M. Calafat, D. Escaich, R. Clergereaux, P. Raynaud, and Y. Segui, Appl. Phys. Lett. 91, 181502 (2007)APPLAB000091000018181502000001.

    A. von Keudell and W. Jacob, J. Appl. Phys. 79, 1092 (1996)JAPIAU000079000002001092000001.

    J. Jolly and J. P. Booth, J. Appl. Phys. 97, 103305 (2005)JAPIAU000097000010103305000001.

    T. Schwarz-Selinger, A. von Keudell, and W. Jacob, J. Appl. Phys. 86, 3988 (1999)JAPIAU000086000007003988000001.

    J. O. Hirschfelder, J. Chem. Phys. 9, 645 (1941)JCPSA6000009000008000645000001.


For access to citing articles, you need to log in.


Figures (8)

Access to article objects (figures, tables, multimedia) requires a subscription; log in to view available files.
(Access to supplementary files, where available, is free for this journal.)



Close

Google Calendar

ADVERTISEMENT

Your Recent History Recent History Help

Recently Viewed

  1. H-atom interaction with amorphous hydrocarbon films: Effect of surface temperature, H flux and exposure time
  2. Simulations of direct-current air glow discharge at pressures ∼ 1 Torr: Discharge model validation
  3. Effect of resonance in external radio-frequency circuit on very high frequency plasma discharge
  4. High power microwave generation from coaxial virtual cathode oscillator using graphite and velvet cathodes
  5. Impurity-related photoluminescence line shape asymmetry in GaAs/AlAs multiple quantum wells: Fractional-dimensional space approach
Go to AIP Home
Copyright © American Institute of Physics
close