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Journal of Applied Physics / Volume 107 / Issue 9 / ARTICLES / Lasers, Optics, and Optoelectronics

J. Appl. Phys. 107, 093104 (2010); http://dx.doi.org/10.1063/1.3357291 (8 pages)

Tunable slow light in semiconductor metamaterial in a broad terahertz regime

Qiang Bai (白强)1, Cong Liu (刘聪)1, Jing Chen2, Chen Cheng (程晨)1, Ming Kang (康明)2, and Hui-Tian Wang (王慧田)1,2

1Department of Physics and Nanjing National Laboratory of Microstructures, Nanjing University, Nanjing 210093, China
2School of Physics and Key Laboratory of Weak Light Nonlinear Photonics, Nankai University, Tianjin 300071, China

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(Received 2 December 2009; accepted 3 February 2010; published online 4 May 2010)

We demonstrate theoretically and numerically that tunable slow light can be realized in planar semiconductor metamaterials with the unit cell composed of two different elements in a broad terahertz regime. In the unit cell, one element is a semiconductor split ring resonator and another one is a semiconductor cut wire. The interaction between the two elements of the unit cell, induced directly or indirectly by the incident electromagnetic wave, leads to a transparent window, resembling the classical analog of electromagnetically induced transparency. This transparent window, caused by the coupling of bright-bright modes or dark-bright modes, can be continuously tuned in a broad frequency regime. The strong normal phase dispersion in the vicinity of this transparent window results in the slow light effect. This scheme provides an alternative way to achieve tunable slow light in a broad frequency band and can find important applications in active and reversibly tunable slow light devices.

© 2010 American Institute of Physics

Article Outline

  1. INTRODUCTION
  2. TYPE-I METAMATERIAL
  3. TYPE-II METAMATERIAL
  4. DISCUSSION AND CONCLUSION

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KEYWORDS and PACS

Keywords

metamaterials, optical resonators, semiconductor materials, slow light

PACS

  • 42.70.Nq

    Other nonlinear optical materials; photorefractive and semiconductor materials

  • 42.65.Re

    Ultrafast processes; optical pulse generation and pulse compression

  • 84.40.-x

    Radiowave and microwave (including millimeter wave) technology

ARTICLE DATA

Digital Object Identifier
http://dx.doi.org/10.1063/1.3357291

PUBLICATION DATA

ISSN

0021-8979 (print)  
1089-7550 (online)

Publisher

$abstract.society.value is a Member of CrossRef American Institute of Physics

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