Influence of gas pressure and applied voltage on Xe excimer radiation from a micro dielectric barrier discharge for plasma display panel

Uchida, Giichiro; Uchida, Satoshi; Kajiyama, Hiroshi; Shinoda, Tsutae

doi:doi:10.1063/1.3236508

Volume/Page
Keyword
DOI
Citation
Advanced

Volume: Page/Article:

Search Content Type

article doi:

Citation:

Accurate control of ion bombardment in remote plasmas using pulse-shaped biasing

This paper deals with a pulsed biasing technique employed to a downstream expanding thermal plasma. Two pulsed biasing approaches are presented: asymmetric rectangular pulses and modulated pulses with a linear voltage slope during the pulse, and their applicability is discussed on the basis of the intrinsic capacitance of the processed substrate-layer system. The substrate voltage and current waveforms are measured, and the relation to the obtained ion energy distributions is discussed. Accurat...

Atomic hydrogen interactions with amorphous carbon thin films

The atomic-scale interactions of H atoms with hydrogenated amorphous carbon (a-C:H) films were identified using molecular dynamics (MD) simulations and experiments based on surface characterization tools. Realistic a-C:H films developed using MD simulations were impinged with H atoms with a kinetic energy corresponding to a temperature of 700 K. The specific chemical reactions of the H atoms with the a-C:H surface were identified through a detailed analysis of the MD trajectories. The MD simula...

We present the influence of gas pressure and applied voltage on Xe excimer radiation from a microdielectric barrier discharge (micro-DBD) in Ne/Xe gas mixture for plasma display panel. Measurements show that the excimer radiation with the 172 nm band lines is strongly observed in the afterglow, and drastically increases with an increase in gas pressure and applied voltage. It is also found that for high gas pressure and low voltage, excimer molecule (Xe2∗) is efficiently produced because of less infrared emission from Xe excited atom. The reaction processes of Xe metastable atom (Xe1s5∗), which is a precursor for Xe2∗, are theoretically analyzed using a one-dimensional fluid model. Increasing gas pressure results in large excimer radiation due to the enhancement of the following three processes, i.e., the conversion process from Xe1s5∗ to Xe2∗, the direct electron impact excitation from ground state to Xe1s5∗, and the collisional de-excitation process from upper level (Xe^∗∗) to Xe1s5∗. The simulation analytical result shows that for lower voltage, Xe1s5∗ is efficiently produced due to the increase in the ratio of direct excitation to Xe1s5∗ from ground state and the suppression of the stepwise ionization from Xe1s5∗ by electron collisions. While for high voltage operation of micro-DBD, the recombination process with Xe molecular ion (Xe2+) and electron contributes to the total excimer radiation, which can be responsible for the large excimer radiation observed in experiment.

Article Outline

INTRODUCTION
EXPERIMENTS
SIMULATION ANALYSIS
1. Conversion process from Xe metastable atom to excimer molecule
2. Production process of Xe metastable atom
3. Loss process of Xe metastable atom
4. Recombination process with Xe2+ and electron
DISCUSSIONS AND CONCLUSIONS

RELATED DATABASES

To view database links for this article, you need to log in.

KEYWORDS and PACS

Keywords

afterglows, discharges (electric), excimers, gas mixtures, ground states, ionisation, neon, plasma applications, plasma displays, xenon

PACS

52.75.-d

Plasma devices
52.77.-j

Plasma applications
52.80.Hc

Glow; corona

ARTICLE DATA

Digital Object Identifier

http://dx.doi.org/10.1063/1.3236508

PUBLICATION DATA

ISSN

0021-8979 (print)

1089-7550 (online)

Publisher

$abstract.society.value is a Member of CrossRef

American Institute of Physics

For access to citing articles, you need to log in.

Figures (19)

Access to article objects (figures, tables, multimedia) requires a subscription; log in to view available files.
(Access to supplementary files, where available, is free for this journal.)