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J. Appl. Phys. 105, 07C517 (2009); http://dx.doi.org/10.1063/1.3074509 (3 pages)

Magnetism of TiO and TiO2 nanoclusters

Xiaohui Wei, Ralph Skomski, B. Balamurugan, Z. G. Sun, Stephen Ducharme, and D. J. Sellmyer

Department of Physics and Astronomy and Nebraska Center for Materials and Nanoscience, University of Nebraska, Lincoln, Nebraska 68508, USA

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(Received 17 September 2008; accepted 9 December 2008; published online 19 March 2009)

Nanoclusters of rocksalt TiO, anatase TiO2, and rutile TiO2 were produced by cluster deposition and examined with transmission-electron microscopy, x-ray diffraction, and magnetization measurements. The clusters are all magnetic at room temperature, but the magnetization is structure- dependent. The hysteresis loops show coercivities that are of the order of 100 Oe and all films show a preferential in-plane magnetization direction. The size dependence of the magnetization was investigated for rutile clusters with average sizes from about 15 to 40 nm. The analysis of the measurements indicates that the magnetism is predominantly located near the surface of the clusters and characterized by a nominal value of 7.6 μB/nm2.

© 2009 American Institute of Physics

Article Outline

  1. INTRODUCTION
  2. EXPERIMENTAL METHODS
  3. RESULTS AND DISCUSSION
  4. CONCLUSIONS

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KEYWORDS and PACS

PACS

  • 81.07.-b

    Nanoscale materials and structures: fabrication and characterization

  • 81.16.-c

    Methods of micro- and nanofabrication and processing

  • 68.37.Og

    High-resolution transmission electron microscopy (HRTEM)

  • 68.55.ag

    Semiconductors

  • 61.46.Bc

    Structure of clusters (e.g., metcars; not fragments of crystals; free or loosely aggregated or loosely attached to a substrate)

  • 75.60.Ej

    Magnetization curves, hysteresis, Barkhausen and related effects

  • 81.15.-z

    Methods of deposition of films and coatings; film growth and epitaxy

ARTICLE DATA

PUBLICATION DATA

ISSN

0021-8979 (print)  
1089-7550 (online)

For access to fully linked references, you need to log in.
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