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J. Appl. Phys. 103, 07E930 (2008); doi:10.1063/1.2838480 (3 pages)

Initial studies on microelectromechanical system flux concentrators

James E. Burnette1, Alan S. Edelstein1, G. A. Fischer1, E. Nowak2, W. Bernard3, Shu Fan Cheng4, Cathy Nordman5, and W. F. Egelhoff, Jr.6

1U.S. Army Research Laboratory, Adelphi, Maryland 20783, USA
2Department of Physics and Astronomy, University of Delaware, Newark, Delaware 19711, USA
3The MEMS and Nanotechnology Exchange, Reston, Virginia 20191, USA
4NRL, Washington, DC 20375, USA
5NVE, Eden Prairie, New Mexico 55344, USA
6National Institute of Standards and Technology, Gaithersburg, Maryland 20899, USA

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(Received 11 September 2007; accepted 30 November 2007; published online 14 March 2008)

To take advantage of the potential offered by the recent increase in the magnetoresistance of magnetic tunnel junctions, it is necessary to address the problem of 1/f noise. ARL has been working on a device, the microelectromechanical system (MEMS) flux concentrator, that mitigates this problem by modulating the sensed magnetic field so that the sensor operates at a higher frequency region where the 1/f noise is smaller. Initial results of testing the device are reported. Though the final step in the fabrication of the device appears to have adversely affected the MEMS motion, two important results were obtained. They are (1) applying the large amplitude voltage at kilohertz frequencies necessary to drive the MEMS structure does not increase the background noise and (2) even though the width of the drive voltage is several hertz, one can demodulate the signal using a lock-in amplifier in order to extract 1 Hz modulation signals. This last result shows that the sensor can be used to detect slow moving or varying magnetic anomalies.

© 2008 American Institute of Physics

Article Outline

  1. INTRODUCTION
  2. FABRICATION AND TESTING
  3. CONCLUSIONS AND OUTLOOK

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KEYWORDS and PACS

PACS

  • 85.85.+j

    Micro- and nano-electromechanical systems (MEMS/NEMS) and devices

  • 07.10.Cm

    Micromechanical devices and systems

PUBLICATION DATA

ISSN:

0021-8979 (print)  
1089-7550 (online)

For access to fully linked references, you need to log in.
    P. D. D. Schwindt, S. Knappe, V. Shah, L. Hollberg, J. Kitching, L.-A. Liew, and J. Moreland, Appl. Phys. Lett. 85, 6409 (2004)APPLAB000085000026006409000001.

    P. D. D. Schwindt, B. Lindseth, S. Knappe, V. Shah, J. Kitching, and L.-A. Liew, Appl. Phys. Lett. 90, 081102 (2007)APPLAB000090000008081102000001.

    J. Scola, H. Polovy, C. Fermon, M. Pannetier-Lecoeur, G. Feng, K. Fahy, and J. M. D. Coey, Appl. Phys. Lett. 90, 252501 (2007)APPLAB000090000025252501000001.

    A. S. Edelstein, G. A. Fischer, M Pedersen, E. R. Nowak, S. F. Cheng, and C. A. Nordman, J. Appl. Phys. 99, 08B317 (2006)JAPIAU00009900000808B317000001.


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